[HN Gopher] What's Next for Transistors and Chiplets?
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       What's Next for Transistors and Chiplets?
        
       Author : PaulHoule
       Score  : 24 points
       Date   : 2021-10-26 14:10 UTC (8 hours ago)
        
 (HTM) web link (semiengineering.com)
 (TXT) w3m dump (semiengineering.com)
        
       | justahuman1 wrote:
       | There was a lot of new vocabulary in that for me, whats a good
       | starting point for learning about modern transistors?
        
         | dragontamer wrote:
         | There's not much to say aside from "the physical shape of the
         | thing matters", and that people are discovering new shapes all
         | the time.
         | 
         | I don't know if there's an easy introduction. But lemme try to
         | make one really quick anyway.
         | 
         | * Transistors themselves are just a hunk of metal, silicon
         | (n-type and p-type) arranged on a platter in a particular way.
         | They are physical objects, and you will do well to remember
         | that. New "shapes" are invented all the time: FinFET, GAA (Gate
         | All Around), and Nanosheets (brought up in this article) are
         | "just" different shapes, with GAA having the best attributes so
         | far.
         | 
         | * The primary difficulty isn't really about "coming up" with a
         | better shape. Everyone knew GAA would have the best attributes
         | compared to others. The question is how do you __MANUFACTURE__
         | the darn thing. These things are nanometers in size, its not
         | very easy to make these shapes when your shapes are so
         | incredibly tiny.
         | 
         | * Transistors are an analog device, not binary/digital. You
         | need an arrangement of transistors to do something: Diode-
         | logic, Diode-resistor logic, Transistor-transistor logic, nMOS,
         | and other arrangements have existed in the past. But... CMOS is
         | the big winner from the 1970s onwards. As such, understanding
         | how transistors are arranged to make your AND/OR/NAND/Flip
         | flops is kinda important. That being said, I'll skip over the
         | details, aside from saying "CMOS" is the status quo, and has
         | the following characteristics.
         | 
         | * In CMOS-arrangements... when the transistor is "on", you want
         | less resistance. A transistor that offers 0.1 ohms of
         | resistance will be better than one that offers 0.5 ohms of
         | resistance (within the realm of CMOS)
         | 
         | * When the transistor is "off", you want less leakage. The
         | switch will always "leak" some electrons down the wrong path,
         | its the nature of physical object. A transistor that leaks
         | 1-femtoamp is better than a transistor that leaks 5-femtoamps.
         | (temperature dependent: the hotter a transistor is, the more it
         | leaks). Again, CMOS-specific.
         | 
         | * Transistors take a certain amount of time to switch from 0 to
         | 1, largely based off of the gate-capacitance. The lower the
         | capacitance, the faster you can turn the switch on (or off).
         | Being able to go from 0V to 1V in 0.1 nanosecond with 1
         | femtoamp of electricity... is better than doing the same in 0.2
         | nanoseconds.
         | 
         | * Note: there is a CMOS specific tradeoff mentioned here. Maybe
         | you can keep the same clockrate (5GHz / 0.2 nanoseconds) but
         | use 1/2 the power (0.5 femtoamps instead of 1 femtoamp). In
         | practice, this relationship is complicated as it varies with
         | voltage, but there's usually a region where 2x the voltage
         | leads to 2x the current and 1/2 the delay (aka 2x the clock
         | rate for 4x power consumption). Or... 1/2 the voltage is 1/2
         | the current and 2x the delay (aka: 1/2 speed for 1/4th power).
         | 
         | * For CMOS, lower capacitance means faster switching (meaning
         | more GHz), and lower power usage (meaning more power
         | efficiency). Cutting down capacitance requires the "gate" of
         | the transistor to be surrounded with more-and-more metal. When
         | you increase the surface area of an object, you decrease its
         | capacitance (this is a physical law that applies to your hands,
         | feet, desk, etc. etc. Its how your phone knows where your
         | finger is: by the amount of surface area your finger has over
         | the phone's screen. As that surface area changes, your
         | capacitance changes and the phone tracks your finger as it
         | moves).
         | 
         | * Capacitance / surface area applies at nano-scale objects like
         | transistors. So when you made "fins" (aka: FinFET), your
         | capacitance decreased, because "fins" have more surface area
         | than planar (flat) transistors. FinFET became standard like 5
         | to 10 years ago. To go even further: you need an "even better"
         | shape (where "better" is more surface area). This is called
         | "GAA", gate-all-around, where you surround the gate entirely
         | (physically above, below, and left and right).
         | 
         | * * Photolithography + magic is how these things are physically
         | constructed. So called "Planar" transistors made sense and are
         | relatively simple: you basically shove a bunch of chemicals
         | onto the silicon, and then "reverse take a picture" of it
         | (taking your film, shining light through the film, and then
         | shoving that light through a lens to shrink it down. Like
         | photographs in the 1980s but backwards). Because "planar
         | transistors" are all flat, it was obvious how to make them.
         | 
         | * But how do you _MAKE_ a GAA? Well, no one will tell us. They
         | just show us the pictures of them successfully doing it. The
         | secret sauce is in their magic processes that deposits the bits
         | of metal / silicon / etc. etc. in the correct spots.
         | Photolithography is an innately 2D process: built up layer-by-
         | layer by successive chemicals + light emitted from a film-like
         | substance. They had to make this shape from a bunch of 2D steps
         | (maybe 120+ such steps) played out over the course of 2 or 3
         | months.
         | 
         | --------
         | 
         | So TL;DR: the name of the game is:
         | 
         | 1. Think of a shape with more surface area (less capacitance).
         | 
         | 2. Figure out a way how to take ~120+ steps of the
         | photolithography process to actually _make_ that shape in
         | practice. And remember: you're mass producing 10-billion of
         | these per chip, so you wanna make sure whatever process you do
         | is 99.99999% reliable. A single mistake will cause the chip to
         | be worthless.
         | 
         | That's it. Really. All the "better" shapes have more surface
         | area. The "older" shapes were easier to figure out on #2, while
         | the "future" shapes look really hard for #2, but are obviously
         | better from a surface area perspective.
        
           | baybal2 wrote:
           | The larger the area, the larger is the capacitance.
           | 
           | Being pedantic, what matters is the field strength at the
           | gate edge, and effective S term of device.
        
         | baybal2 wrote:
         | The best cycle of lectures I've ever seen in open access from
         | the Centre for Nano Science and Engineering Bangalore:
         | 
         | https://www.youtube.com/playlist?list=PLbMVogVj5nJT8RG5Q4Cps...
         | 
         | http://www.nitttrc.edu.in/nptel/courses/video/117108047/1171...
        
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